Effects of methane gas flow rate on the optoelectrical properties of nitrogenated carbon thin films grown by surface wave microwave plasma chemical vapor deposition-Reference-Cited by-同舟云学术

Effects of methane gas flow rate on the optoelectrical properties of nitrogenated carbon thin films grown by surface wave microwave plasma chemical vapor deposition

Published:2006-02 Issue:2-3 Volume:15 Page:371-377
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Rusop M.,Adhikari S.,Omer A.M.M.,Soga T.,Jimbo T.,Umeno M.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. The Field Emission Characteristics of a-C:H Thin Films Prepared by Helical Resonator Plasma Enhanced Chemical Vapor Deposition

2. Effects of deposition temperature on the properties of hydrogenated tetrahedral amorphous carbon

3. Substrate Temperature Dependence of the Surface Reaction Mechanism of Methane Plasma Chemical Vapor Depositon: Experimental and Ab Initio Molecular Orbital Study

4. Field emission from tetrahedral amorphous carbon

5. Growth Mechanism and Cross-Sectional Structure of Tetrahedral Amorphous Carbon Thin Films

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