Influence of cathode temperature on gas discharge and growth of diamond films in DC-PCVD processing-Reference-Cited by-同舟云学术

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Influence of cathode temperature on gas discharge and growth of diamond films in DC-PCVD processing

Published:2005-09 Issue:9 Volume:14 Page:1494-1497
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Bai Yizhen,Jin Zengsun,Lv Xianyi,Jiang Zhigang,Wang Jiayu,Wu Hanhua

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference27 articles.

1. W.G. Eversole, U.S. Patent 3,030,188, April 17, 1962.

2. Growth of boron‐doped diamond seed crystals by vapor deposition

3. Vapor growth of diamond on diamond and other surfaces

4. Growth of diamond particles from methane-hydrogen gas

5. Diamond Films and Coatings,1992

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1. Applications in carbon-based film;Modern Ion Plating Technology;2023

2. Past, present, and the future of the research and commercialization of CVD diamond in China;Functional Diamond;2022-11-21

3. Influence of Co Removal for Improving Diamond Films Adhesive on WC-Co Substrates by DC-PCVD;Advanced Materials Research;2012-06

4. Influence of Carbon Source Concentration on Characterization of Boron-Doped Diamond Electrodes;Advanced Materials Research;2011-02

5. Influence of Boron Doping on Growth Characteristic of Diamond Films Prepared by Hot Cathode DC Chemical Vapor Deposition;Journal of Inorganic Materials;2009-06-18

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