Diamond CVD by microwave plasmas in argon-diluted methane without or with 2% hydrogen additive-Reference-Cited by-同舟云学术

Diamond CVD by microwave plasmas in argon-diluted methane without or with 2% hydrogen additive

Published:2005-03 Issue:3-7 Volume:14 Page:261-265
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Tzeng Y.,Liu Y.K.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Y. Tzeng, K. Miyoshi, M. Yoshikawa, M. Murakawa, Y. Koga, K. Kobashi, G.A.J. Amaratunga (Eds.), NASA CP-2001-210948, ISBN 0-9710327-0-X, August 6–10, 2001.

2. Growth of nanocrystalline diamond films by biased enhanced microwave plasma chemical vapor deposition: A different regime of growth

3. S. Rotter, Proceedings of the ADC/FCT '99, MY. K.K. Tokyo, Japan, 1999, p. 25.

4. Fullerenes as precursors for diamond film growth without hydrogen or oxygen additions

5. NANOCRYSTALLINE DIAMOND FILMS

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