Influence of atomic bonds on electrical property of boron carbon nitride films synthesized by remote plasma-assisted chemical vapor deposition-Reference-Cited by-同舟云学术

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Influence of atomic bonds on electrical property of boron carbon nitride films synthesized by remote plasma-assisted chemical vapor deposition

Published:2010-12 Issue:12 Volume:19 Page:1441-1445
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Sota Hiroshi,Kimura Chiharu,Aoki Hidemitsu,Sugino Takashi

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Electrical and optical characteristics of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition

2. Boron carbon nitride film with low dielectric constant as passivation film for high speed electronic devices

3. Characterization and Field Emission of Sulfur-Doped Boron Nitride Synthesized by Plasma-Assisted Chemical Vapor Deposition

4. Electron emission from boron nitride coated Si field emitters

5. Field emission characteristics of boron nitride films

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1. Thin-film (Al)BCN materials synthesized by sequential precursor pulses to mimic atomic layer deposition;AIP Advances;2023-02-01

2. A review of boron carbon nitride thin films and progress in nanomaterials;Materials Today Advances;2020-12

3. Composite GaN–C–Ga (“GaCN”) Layers with Tunable Refractive Index;The Journal of Physical Chemistry C;2018-12-03

4. High quality boron carbon nitride/ZnO-nanorods p-n heterojunctions based on magnetron sputtered boron carbon nitride films;Applied Physics Letters;2014-11-10

5. Effects of annealing temperature and ambient atmosphere on the structure and photoluminescence of BCNO phosphors;Journal of Luminescence;2013-11

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