Chemical-mechanical synergetic effect of single crystal SiC polishing using Fe3O4@MIL-100(Fe) magnetic photo-Fenton catalyst-Reference-Cited by-同舟云学术

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Chemical-mechanical synergetic effect of single crystal SiC polishing using Fe3O4@MIL-100(Fe) magnetic photo-Fenton catalyst

Published:2024-09 Issue: Volume: Page:111545
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Ran Bo,Pan Jisheng,Yan Qiusheng,Wu Qiyuan,Zhuang Rongji,Zhou Yongze,Zhao Ziqi,Zhang Xiaowei

Funder

Basic and Applied Basic Research Foundation of Guangdong Province

National Natural Science Foundation of China

National Key Research and Development Program of China

Publisher

Elsevier BV

Reference29 articles.

1. Fundamental research on semiconductor SiC and its applications to power electronics;Matsunami;Proceedings of the Japan Academy, Series B,2020

2. Novel full-scale model verified by atomic surface and developed composite microfiber and slurry polishing system;Zhao;Compos. Part B Eng.,2024

3. Advanced polishing methods for atomic-scale surfaces: a review;Luo;Materials Today Sustainability,2024

4. Development of core–shell SiO2@A-TiO2 abrasives and novel photocatalytic chemical machinal polishing for atomic surface of fused silica;Shi;Appl. Surf. Sci.,2024

5. Atomic surface achieved through a novel cross-scale model from macroscale to nanoscale;Zhao;Nanoscale,2024

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