Optical and mass spectroscopy measurements of Ar/CH4/H2 microwave plasma for nano-crystalline diamond film deposition-Reference-Cited by-同舟云学术

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Optical and mass spectroscopy measurements of Ar/CH4/H2 microwave plasma for nano-crystalline diamond film deposition

Published:2007-04 Issue:4-7 Volume:16 Page:675-678
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Zhou Haiyang,Watanabe Jun,Miyake Masato,Ogino Akihisa,Nagatsu Masaaki,Zhan Rujuan

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Carbon dimer, C2, as a growth species for diamond films from methane/hydrogen/argon microwave plasmas

2. Compositional mapping of the argon–methane–hydrogen system for polycrystalline to nanocrystalline diamond film growth in a hot-filament chemical vapor deposition system

3. Bonding structure in nitrogen doped ultrananocrystalline diamond

4. The role of C2 in nanocrystalline diamond growth

5. Deposition of NCD films using hot filament CVD and Ar/CH4/H2 gas mixtures

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