Deposition of nanocrystalline diamond films in pulsed Ar/H2/CH4 microwave discharges-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Deposition of nanocrystalline diamond films in pulsed Ar/H2/CH4 microwave discharges

Published:2007-04 Issue:4-7 Volume:16 Page:1295-1299
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Monéger D.,Bénédic F.,Azouani R.,Chelibane F.,Syll O.,Silva F.,Gicquel A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. Formation of Diamond Films by Intermittent Discharge Plasma Chemical Vapor Deposition

2. Multiple growth and characterization of thick diamond single crystals using chemical vapour deposition working in pulsed mode

3. Pulse modulated electron cyclotron resonance plasma for chemical vapor deposition of diamond films

4. Diamond thin film growth by pulsed microwave plasma at high power density in a CH4–H2 gas mixture

5. Investigation of chemical kinetics and energy transfer in a pulsed microwave H2/CH4plasma

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Microwave-excited atmospheric pressure plasma jet with wide aperture for the synthesis of carbon nanomaterials;Japanese Journal of Applied Physics;2014-11-05

2. Growth of large size diamond single crystals by plasma assisted chemical vapour deposition: Recent achievements and remaining challenges;Comptes Rendus Physique;2013-02

3. Investigation of the optimized parameters of microwave plasma-assisted chemical vapour deposition reactor operation in a pulsed mode;Journal of Physics D: Applied Physics;2012-09-13

4. Deposition and characterization of smooth ultra-nanocrystalline diamond film in CH4/H2/Ar by microwave plasma chemical vapor deposition;Vacuum;2010-06

5. Erosive wear resistance of NCD coatings produced by pulsed microwave discharges;Diamond and Related Materials;2010-05

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3