Cycle of two-step etching process using ICP for diamond MEMS applications-Reference-Cited by-同舟云学术

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Cycle of two-step etching process using ICP for diamond MEMS applications

Published:2007-04 Issue:4-7 Volume:16 Page:996-999
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Yamada Takatoshi,Yoshikawa Hiromichi,Uetsuka Hiroshi,Kumaragurubaran Somu,Tokuda Norio,Shikata Shin-ichi

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Diamond micro system for bio-chemistry

2. Scanning probe with an integrated diamond heater element for nanolithography

3. Proc. 6th ADC/2nd FCT Joint Conference;Shibata,2001

4. 6th ADC/2nd FCT Joint Conference;Holmes,2001

5. An “all-diamond” inkjet realized in sacrificial layer technology

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