Solid phase crystallization of amorphous silicon on glass by thin film heater for thin film transistor (TFT) application
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference7 articles.
1. Characteristics of polycrystalline-Si thin film transistors fabricated by excimer laser annealing method
2. Crystallized Si films by low‐temperature rapid thermal annealing of amorphous silicon
3. Low temperature poly-Si thin-film transistor fabrication by metal-induced lateral crystallization
4. Crystal grain nucleation in amorphous silicon
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2. Effects of laser parameters on optoelectronic properties of polycrystalline silicon films prepared by two-step annealing process;The International Journal of Advanced Manufacturing Technology;2017-07-13
3. Microsecond Crystallization of Amorphous Silicon Films on Glass Substrates by Joule Heating;ECS Journal of Solid State Science and Technology;2016
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5. Thermal warpage of a glass substrate during Xe-arc flash lamp crystallization of amorphous silicon thin-film;International Journal of Thermal Sciences;2014-09
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