Effects of dissolved hydrogen on the crack-initiation and oxidation behavior of nickel-based alloys in high-temperature water
Author:
Publisher
Elsevier BV
Subject
General Materials Science,General Chemical Engineering,General Chemistry
Reference41 articles.
1. XPS and STM study of the growth and structure of passive films in high temperature water on a nickel-base alloy;Machet;Electrochim. Acta,2004
2. X-ray photoelectron studies of the aqueous oxidation of inconel-600 alloy;McIntyre;J. Electrochem. Soc.,1979
3. The effect of chromium, carbon, and yttrium on the oxidation of nickel-base alloys in high temperature water;Angeliu;J. Electrochem. Soc.,1993
4. Analysis and TEM examinations of corrosion scales grown on alloy 690 exposed to PWR environment;Carrette;Mater. High Temp.,2003
5. Effects of aging temperature on microstructural evolution at dissimilar metal weld interfaces;Choi;J. Nucl. Mater.,2015
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