Author:
Elabar D.,Němcová A.,Hashimoto T.,Skeldon P.,Thompson G.E.
Funder
Engineering and Physical Sciences Research Council U.K.
European Community
Subject
General Materials Science,General Chemical Engineering,General Chemistry
Reference43 articles.
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5. The use of Rutherford backscattering to study the behavior of ion-implanted atoms during anodic oxidation of aluminum: Ar, Kr, Xe, K, Rb, Cs, Cl, Br, and I;Brown;J. Electrochem. Soc.,1973
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