Thermodynamic Study of the Chemical Vapour Deposition in the SiBCHCl System-Reference-Cited by-同舟云学术

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Thermodynamic Study of the Chemical Vapour Deposition in the SiBCHCl System

Published:1994-10 Issue:4 Volume:18 Page:369-385
ISSN:0364-5916
Container-title:Calphad
language:en
Short-container-title:Calphad

Author:

Goujard S.,Vandenbulcke L.,Bernard C.

Publisher

Elsevier BV

Subject

Computer Science Applications,General Chemical Engineering,General Chemistry

Reference35 articles.

1. J.J. Choury, C.O.M.D.E.F., Washington, September (1988).

2. Proceedings of the National SAMPE Technical Conference;Rogers,1975

3. F.S. Galasso and R.D. Veltri, U.S. Patent, N° 4, 425, 407, (10 Jan. 1984).

4. R.D. Veltri and F.S. Galasso, U.S. Patent, N° 4, 476, 178, (9 Oct. 1984).

5. R.A. Holzl, U.S. Patent, N° 4, 515, 860 (7 May 1985).

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Studies of Gas-Phase Reactivity during Chemical Vapor Deposition of Boron Carbide;Developments in Strategic Materials and Computational Design III;2012-12-03

2. Effect of Deposition Temperature on Dynamics and Mechanism of Deposition for Si–B–C Ceramic from BCl3/SiCH3Cl3/H2 Precursor;Journal of Materials Science & Technology;2012-09

3. Methyldichloroborane Evidenced as an Intermediate in the Chemical Vapour Deposition Synthesis of Boron Carbide;Journal of Nanoscience and Nanotechnology;2011-09-01

4. Thermodynamic assessment of the B–C–Si system;Journal of Alloys and Compounds;2009-07

5. B-C-Si Ternary Phase Diagram Evaluation;MSI Eureka;2009-04-03

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