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Control-oriented plasma modeling and controller design for reactive sputtering

  • Published:2021-06 Issue: Volume:16 Page:100142
  • ISSN:2468-6018
  • Container-title:IFAC Journal of Systems and Control
  • language:en
  • Short-container-title:IFAC Journal of Systems and Control

Author:

Woelfel Christian,Oberberg MoritzORCID,Berger BirkORCID,Engel Dennis,Brinkmann Ralf Peter,Schulze JulianORCID,Awakowicz Peter,Lunze Jan

Funder

Deutsche Forschungsgemeinschaft

Publisher

Elsevier BV

Subject

Aerospace Engineering

Reference17 articles.

1. Modeling of reactive sputtering of compound materials;Berg;Journal of Vacuum Science and Technology A,1987

2. Making magnetron sputtering work: Modelling reactivesputtering dynamics, part 2;Christie;Society of Vacuum Coaters Bulletin Spring,2015

3. Determination of the effective electron emission yields of compound materials;Depla;Journal of Physics D: Applied Physics,2008

4. Tracing the recorded history of thin-film sputter deposition: From 1800s to 2017;Greene;Journal of Vacuum Science and Technology A,2017

5. Oxygen discharges diluted with argon: dissociation processes;Gudmundsson;Plasma Sources, Science and Technology,2007

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Robust interval observer for substrate state estimation of nonlinear reactive sputter processes;2023 IEEE Conference on Control Technology and Applications (CCTA);2023-08-16

2. 2022 Review of Data-Driven Plasma Science;IEEE Transactions on Plasma Science;2023-07

3. Observability analysis and substrate state estimation of nonlinear reactive sputter processes;2023 24th International Conference on Process Control (PC);2023-06-06

4. Experimental investigations of plasma dynamics in the hysteresis regime of reactive RF sputter processes;Plasma Sources Science and Technology;2022-06-01
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