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Chemical vapor deposition of boron-carbon films using organometallic reagents

  • Published:1996-08 Issue:6 Volume:27 Page:327-332
  • ISSN:0167-577X
  • Container-title:Materials Letters
  • language:en
  • Short-container-title:Materials Letters

Author:

Lewis John S.,Vaidyaraman Sundar,Lackey W.Jack,Agrawal Pradeep K.,Freeman Garth B.,Barefield E.Kent

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference6 articles.

1. High-Efficiency Delta-Doped Amorphous Silicon Solar Cells Prepared by Photochemical Vapor Deposition

2. Pyrolysis of trimethylborane. Part 2. Formation of carbaboranes and other boron-containing compounds

3. J.D. Odom, in: Comprehensive Organometallic Chemistry, eds. G. Wilkinson, F.G.A. Stone and E.W. Abel, Vol. 1, ch. 5.1.

4. Proceedings of 7th International conference on CVD;Pierson,1979

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