The molecular mechanism of novolak–diazonaphthoquinone resists-Reference-Cited by-同舟云学术

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The molecular mechanism of novolak–diazonaphthoquinone resists

Published:2002-04 Issue:4 Volume:38 Page:619-629
ISSN:0014-3057
Container-title:European Polymer Journal
language:en
Short-container-title:European Polymer Journal

Author:

Reiser A.,Huang J.P.,He X.,Yeh T.F.,Jha S.,Shih H.Y.,Kim M.S.,Han Y.K.,Yan K.

Publisher

Elsevier BV

Subject

Organic Chemistry,Polymers and Plastics,General Physics and Astronomy,Materials Chemistry

Reference33 articles.

1. Diazonaphthoquinone-based resists SPIE tutorial texts;Dammel,1993

2. Organic resist materials;Willson,1994

3. Photoreactive polymers, The science and technology of resists;Reiser,1989

4. Über die Natur der Belichtungsprodukte von Diazoverbindungen. Übergänge von aromatischen 6-Ringen in 5-Ringe

5. Über die Natur der Lichtzersetzungsprodukte von Diazoaminoverbindungen und Diazophenoläthern (III)

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