The influence of nitrogen on the optical and electrical properties of sputtered a-Si56Ge44:N:H films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference27 articles.
1. Structural, electrical, and optical properties ofa-Si1−xGex:H and an inferred electronic band structure
2. Structural, optical, and spin properties of hydrogenated amorphous silicon‐germanium alloys
3. Optical and electrical properties of hydrogenated amorphous Si1-xGex alloy thin films prepared by planar magnetron sputtering
4. NMR and ESR studies on a-Si1−xGex:H prepared by magnetron sputtering
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1. The properties of aluminum oxide and nitride films prepared by d.c. sputter-deposition from metallic targets;Surface and Coatings Technology;2003-01
2. Optical and structural properties of highly c-axis oriented aluminum nitride prepared by sputter-deposition in pure nitrogen;Thin Solid Films;2000-12
3. Bombardment by Reflection - A Novel Method to Prepare High Quality Hydrogenated Amorphous Germanium by Anodic PCVD;MRS Proceedings;1997
4. Electrical, optical and structural properties of a-SiNGe:H films prepared by the r.f. glow-discharged decomposition;Thin Solid Films;1996-08
5. The formation of germanium nanocrystals by thermal annealing of a-SiOx: H/a-GeOx: H multilayers;physica status solidi (b);1996-02-01
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