DC current transport in rf sputtered SiO2 films in the temperature range 77–357 K

Author:

Meaudre R.,Meaudre M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference52 articles.

Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Interlevel Dielectrics;Handbook of Semiconductor Interconnection Technology, Second Edition;2006-02-22

2. DC conduction in diamond-like carbon films obtained by low-energy cluster beam deposition;Journal of Non-Crystalline Solids;1995-11

3. The field-dependence of the conductivity for the high-temperature small-polaron hopping regime in disordered systems;Journal of Physics C: Solid State Physics;1987-08-30

4. Nucleation, growth and characterization of thin solid films;Progress in Crystal Growth and Characterization;1987-01

5. Space-charge-limited conduction in r.f.-sputtered pure and vanadium-doped amorphous SiO2 films;Thin Solid Films;1986-12

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