Catalytic chemical vapor deposition method to obtain high quality amorphous silicon and silicon-germanium
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. Proc. of 18th IEEE Photovoltaic Specialist Conf.;Matsumura,1985
2. Catalytic Chemical Vapor Deposition (CTC-CVD) Method Producing High Quality Hydrogenated Amorphous Silicon
3. Electronic properties of substitutionally doped amorphous Si and Ge
4. Guiding Principle in the Preparation of High-Photosensitive Hydrogenated Amorphous Si-Ge Alloys from Glow-Discharge Plasma
5. Chemical Vapor Deposition of a-SiGe:H Films Utilizing a Microwave-Excited Plasma
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1. Effect of pressure on the gas-phase chemistry when using monomethylsilane and dimethylsilane in hot-wire chemical vapor deposition;Canadian Journal of Chemistry;2015-01
2. Adsorption of Disilyne [Si(H[sub 2])Si] and Disilene (H[sub 2]SiSiH[sub 2]) on the Si(100)-2×1 Surface and on the H-Terminated Si(100)-2×1 Surface;Journal of The Electrochemical Society;2008
3. Intrinsic Microcrystalline Silicon Thin Films Prepared by Hot-Wire Cell Method and Their Application to Solar Cells;Japanese Journal of Applied Physics;2004-12-09
4. 2-Step Growth Method and Microcrystalline Silicon Thin Film Solar Cells Prepared by Hot Wire Cell Method;Japanese Journal of Applied Physics;2004-05-11
5. Space‐charge‐limited current investigation of the density of states ina‐SiGe:H alloys;Journal of Applied Physics;1991-07-15
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