Amorphous SiOx:H alloy films as wide optical-gap materials
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. Electrical and optical properties of amorphous silicon carbide, silicon nitride and germanium carbide prepared by the glow discharge technique
2. 17th Conf. on Solid State Device and Materials;Kim,1985
3. Wide Optical-Gap, Photoconductive a-SixN1-x:H
4. Structure and Defects in Amorphous Si–O Films
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Performance of p-type silicon-oxide windows in amorphous silicon solar cell;Solar Energy Materials and Solar Cells;2001-02
2. A structural interpretation of SiOSi vibrational absorption of high-photoconductive amorphous a-SiOx:H films;Journal of Non-Crystalline Solids;1996-02
3. Physical properties of a-SiOx : H alloys prepared by dc magnetron sputtering with water vapour as oxygen source;Journal of Non-Crystalline Solids;1994-03
4. Properties of Photosensor with Amorphous Si:H/SiOx:H Double-Layer Structure;Japanese Journal of Applied Physics;1992-03-15
5. Properties of Silicon-Oxygen Alloy Films Prepared from SiH4+CO2Gas Mixture;Japanese Journal of Applied Physics;1991-12-15
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