Amorphous silicide formation in the Cr/amorphous silicon system-Reference-Cited by-同舟云学术

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Amorphous silicide formation in the Cr/amorphous silicon system

Published:1993-12 Issue: Volume:164-166 Page:857-860
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Masaki Y.,Nonomura S.,Gibson R.A.G.,Sakimoto T.,Kurokawa T.,Kawai H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Phase transformations in the Cr/a-Si system during low temperature annealing

2. Structural interpretation of the vibrational spectra ofa-Si: H alloys

3. Investigation on structural changes in amorphous tetrahedral alloys by means of differential scanning calorimetry

4. Calorimetric studies of crystallization and relaxation of amorphous Si and Ge prepared by ion implantation

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Kinetics of solid phase interaction between Al anda‐Si:H;Journal of Applied Physics;1994-11

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