1. The REBL DPG: Recent innovations and remaining challenges;Carroll;Proceedings of SPIE,2014
2. Demonstration of lithography patterns using reflective e-beam direct write;Freed;Proceedings of SPIE,2011
3. Grella, L., Freed, R., & McCord, M. A. (2012). Electron reflector with multiple reflective modes. U.S. Patent 8,089,051 B2.
4. Digital pattern generator: An electron-optical MEMS for massively parallel reflective electron beam lithography;Grella;Journal of Micro/Nanolithography, MEMS, and MOEMS,2013
5. Reflective electon beam lithography: Progress in printing with CMOS DPG chip;Gubiotti;SPIE Alternative Lithographic Technologies VI,2014