Efficient electron beam condensing for low-energy microcolumn lithography-Reference-Cited by-同舟云学术

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Efficient electron beam condensing for low-energy microcolumn lithography

Published:2008-01 Issue:1 Volume:39 Page:94-98
ISSN:0026-2692
Container-title:Microelectronics Journal
language:en
Short-container-title:Microelectronics Journal

Author:

Kim Ho Seob,Ahn Seungjoon,Kim Dae Wook,Oh Tae-Sik,Ahn Seong Joon

Publisher

Elsevier BV

Subject

General Engineering

Reference8 articles.

1. Experimental evaluation of a 20×20mm footprint microcolumn;Kratschmer;J. Vac. Sci. Technol. B,1996

2. Electron-beam microcolumns for lithography and related applications;Chang;J. Vac. Sci. Technol. B,1996

3. Advances in arrayed microcolumn lithography;Muray;J. Vac. Sci. Technol. B,2000

4. Multiple electron-beam lithography;Chang;Microelectron. Eng.,2001

5. The assembly of a fully functional microcolumn and its STEM-mode operation;Kim;J. Kor. Phys. Soc.,2003

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2. Geometrical Dependency of Wiggler Characteristics in the Miniaturized Free Electron Laser Module;Materials Science Forum;2011-07

3. Investigation of Antiadhesive Coatings for Nanoimprinting Lithography;Materials and Manufacturing Processes;2010-07-23

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