1. Self-aligned double patterning aware pin access and standard cell layout co-optimization;Xu,2015
2. PARR: pin access planning and regular routing for self-aligned double patterning;Xu,2015
3. Standard cell layout regularity and pin access optimization considering middle-of-line;Xu,2015
4. Standard cell pin access and physical design in advanced lithography;Xu,2016
5. Pin accessibility-driven detailed placement refinement;Ding,2017