Surface characterization and electrochemical properties of tantalum nitride (TaN) nanostructured coatings produced by reactive DC magnetron sputtering-Reference-Cited by-同舟云学术

Surface characterization and electrochemical properties of tantalum nitride (TaN) nanostructured coatings produced by reactive DC magnetron sputtering

Published:2020-12 Issue: Volume:21 Page:100685
ISSN:2468-0230
Container-title:Surfaces and Interfaces
language:en
Short-container-title:Surfaces and Interfaces

Author:

Babaei Kazem,Fattah-alhosseini Arash^ORCID,Elmkhah Hassan,Ghomi Hamidreza

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,General Physics and Astronomy,Condensed Matter Physics,Surfaces and Interfaces,General Chemistry

Reference45 articles.

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4. Role of anodic passive potential on the electrochemical response of pure tantalum in 0.1M H2SO4 solution;Fattah-alhosseini;Anal. Bioanal. Electrochem.,2017

5. Immersion time and passive potential role on the passive and electrochemical response of tantalum in 0.1M HNO3 solution;Fattah-alhosseini;Mater. Res. Express,2018

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