Magnetron sputtering of liquid metals to quickly fabricate gallium-based nano electronic and semiconducting films-Reference-Cited by-同舟云学术

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Magnetron sputtering of liquid metals to quickly fabricate gallium-based nano electronic and semiconducting films

Published:2024-03 Issue: Volume:46 Page:104000
ISSN:2468-0230
Container-title:Surfaces and Interfaces
language:en
Short-container-title:Surfaces and Interfaces

Author:

Chen Xueqing,Tian Lifeng,Xing Zerong,Du Bangdeng,Xiang Wentao,Wang Qian,Cui Yuntao^ORCID,Liu Jing^ORCID

Funder

NSFC

Publisher

Elsevier BV

Reference63 articles.

1. Directional solidification and melting of eutectic GaIn;Koster;Cryst. Res. Technol.,1999

2. On the system Gallium - Indium - Tin;van Ingen;Scr. Metall.,1970

3. Liquid metal-based paper electronics: materials, methods, and applications;Jiang;Sci. China: Technol. Sci.,2023

4. Liesegang phenomenon of liquid metals on Au film;Xing;Adv. Mater.,2023

5. Liquid metal E-tattoo;Gao;Sci. China: Technol. Sci.,2023

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A low-cost and convenient route of fabricating GaN films with P-type mixed microcrystalline and amorphous structure deposited via Ga target of magnetron sputtering;APL Materials;2024-08-01

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