Elemental diffusion study of Ge/Al2O3 and Ge/AlN/Al2O3 interfaces upon post deposition annealing-Reference-Cited by-同舟云学术

Elemental diffusion study of Ge/Al2O3 and Ge/AlN/Al2O3 interfaces upon post deposition annealing

Published:2017-12 Issue: Volume:9 Page:51-57
ISSN:2468-0230
Container-title:Surfaces and Interfaces
language:en
Short-container-title:Surfaces and Interfaces

Author:

Zhu Yunna,Wang Xinglu,Liu Chen,Wang Tao,Chen Hongyan,Wang Wei-Hua,Cheng Yahui,Wang Weichao,Wang Jiaou,Wang Shengkai,Cho Kyeongjae,Liu Hui,Lu Hongliang,Dong Hong

Funder

National Natural Science Foundation of China

Tianjin Natural Science Foundation

Chinese Academy of Sciences

Shanghai Municipal Education Commission

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,General Physics and Astronomy,Condensed Matter Physics,Surfaces and Interfaces,General Chemistry

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