SiOx films deposited by HFCVD: Their conduction response to light and intrinsic photovoltaic effect-Reference-Cited by-同舟云学术

SiOx films deposited by HFCVD: Their conduction response to light and intrinsic photovoltaic effect

Published:2021-10 Issue: Volume:26 Page:101411
ISSN:2468-0230
Container-title:Surfaces and Interfaces
language:en
Short-container-title:Surfaces and Interfaces

Author:

Simón Zaira Jocelyn Hernández^ORCID,López José Alberto Luna,de la Luz Álvaro David Hernández,Salgado Godofredo García,Leyva Karim Monfil,López Jesús Carrillo,Conde Gabriel Omar Mendoza,Lara Alfredo Benítez,Hernández Haydee Patricia Martínez,Hernández Erick Gastellou,Méndez Javier Flores^ORCID

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,General Physics and Astronomy,Condensed Matter Physics,Surfaces and Interfaces,General Chemistry

Reference36 articles.

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2. SiOx by magnetron sputtered revisited: tailoring the photonic properties of multilayers;García-Valenzuela;Appl. Surf. Sci.,2019

3. Spectroscopic and microscopic correlation of SRO-HFCVD films on quartz and silicon;Martínez Hernández;Crystals,2020

4. Wearable and semitransparent pressure-sensitive light-emitting sensor based on electrochemiluminescence;Kwon;ACS Nano,2020

5. Analysis of the conduction mechanisms responsible for multilevel bipolar resistive switching of SiO2/Si multilayer structures;González-Flores;Superlattices Microstruct.,2020

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