The dielectric response of low-k interlayer dielectric material characterized by electron energy loss spectroscopy-Reference-Cited by-同舟云学术

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The dielectric response of low-k interlayer dielectric material characterized by electron energy loss spectroscopy

Published:2014-03 Issue: Volume:187 Page:23-28
ISSN:1387-1811
Container-title:Microporous and Mesoporous Materials
language:en
Short-container-title:Microporous and Mesoporous Materials

Author:

Singh Pradeep K.,Knaup Jan M.,Zimmermann Sven,Schulze Steffen,Schulz Stefan E.,Frauenheim Thomas,Hietschold Michael

Publisher

Elsevier BV

Subject

Mechanics of Materials,Condensed Matter Physics,General Materials Science,General Chemistry

Reference22 articles.

1. Low Dielectric Constant Materials for ULSI Interconnects

2. Low dielectric constant films prepared by plasma-enhanced chemical vapor deposition from tetramethylsilane

3. A Fourier series method for numerical Kramers-Kronig analysis

4. Electron Energy-Loss Spectroscopy in the Electron Microscope;Egerton,1996

5. Excitation of Plasmons and Interband Transitions by Electrons;Raether,1980

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