Thin film coating of silicon carbide on zircaloy-4 tube by FCVD process and a study on its kinetics-Reference-Cited by-同舟云学术

Thin film coating of silicon carbide on zircaloy-4 tube by FCVD process and a study on its kinetics

Published:2021-08 Issue: Volume:552 Page:152996
ISSN:0022-3115
Container-title:Journal of Nuclear Materials
language:en
Short-container-title:Journal of Nuclear Materials

Author:

Mandal D.^ORCID,Dabhade P.A.,Chougule B.K.

Funder

Bhabha Atomic Research Centre

Publisher

Elsevier BV

Subject

Nuclear Energy and Engineering,General Materials Science,Nuclear and High Energy Physics

Reference53 articles.

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4. Kinetic study of silicon carbide deposited from methyltrichlorosilane precursor;Tsai;J. Mat. Res.,1994

5. Experimental kinetic study of the chemical vapour deposition of SiC-based ceramics from CH3SiCl3H2 gas precursor;Loumagne;J. Cryst. Growth.,1995

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