Dissolution of copper thin films in hydroxylamine-based solutions-Reference-Cited by-同舟云学术

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Dissolution of copper thin films in hydroxylamine-based solutions

Published:2003-09 Issue:1-4 Volume:72 Page:365-372
ISSN:0301-7516
Container-title:International Journal of Mineral Processing
language:en
Short-container-title:International Journal of Mineral Processing

Author:

Huang Wayne,Tamilmani Subramanian,Raghavan Srini,Small Robert

Publisher

Elsevier BV

Subject

Geochemistry and Petrology,Geotechnical Engineering and Engineering Geology

Reference13 articles.

1. Copper Corrosion With and Without Inhibitors

2. Huang, H., STABCAL, Computer program developed at Montana Tech, Butte, MT.

3. Huang, W., 2003. PhD dissertation in preparation, University of Arizona, Tucson.

4. Chemical Mechanical Planarization in IC Device Manufacturing III, PV 99-37;Huang,1999

5. Corrosion Inhibition of Copper with Benzotriazole and Other Organic Surfactants

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