Growth characteristics and properties of RuAlO hybrid films fabricated by atomic layer deposition-Reference-Cited by-同舟云学术

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Growth characteristics and properties of RuAlO hybrid films fabricated by atomic layer deposition

Published:2023-01 Issue: Volume:608 Page:155200
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Gong Ting,Qin Lijun,Hu Yiyun,Li Jianguo,Zhang Wangle,Hui Longfei,Feng Hao

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference59 articles.

1. 25th Anniversary Article: Hybrid Nanostructures Based on Two-Dimensional Nanomaterials;Huang;Adv. Mater.,2014

2. Atomic Layer Deposition of Rare-Earth-Based Binary and Ternary Oxides for Microelectronic Applications;Wiemer;Semicond. Sci. Technol.,2012

3. Rational Design of Atomic-Layer-Deposited LiFePO4 as a High-Performance Cathode for Lithium-Ion Batteries;Liu;Adv. Mater.,2014

4. Atomic Layer Deposition of W: Al2O3 Nanocomposite Films with Tunable Resistivity;Mane;Chem. Vap. Depos.,2013

5. Nanometer-Thick MgxZn(1–x)O Ternary Films for Photovoltaics;Peng;ACS Appl. Nano Mater.,2020

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