Characterization of anti-adhesive self-assembled monolayer for nanoimprint lithography-Reference-Cited by-同舟云学术

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Characterization of anti-adhesive self-assembled monolayer for nanoimprint lithography

Published:2008-12 Issue:5 Volume:255 Page:2885-2889
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Zhou Weimin,Zhang Jing,Liu Yanbo,Li Xiaoli,Niu Xiaomin,Song Zhitang,Min Guoquan,Wan YongZhong,Shi Liyi,Feng Songlin

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference15 articles.

1. Recent progress in nanoimprint technology and its applications

2. One-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography

3. Fabrication of Ge2Sb2Te5 based PRAM device at 60nm scale by using UV nanoimprint lithography

4. Fabrication of photonic crystal structures on light emitting diodes by nanoimprint lithography

5. Properties of thin anti-adhesive films used for the replication of microstructures in polymers

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