Surface characterization of TiO2 thin films obtained by high-energy reactive magnetron sputtering-Reference-Cited by-同舟云学术

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Surface characterization of TiO2 thin films obtained by high-energy reactive magnetron sputtering

Published:2008-05 Issue:14 Volume:254 Page:4396-4400
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Wasielewski R.,Domaradzki J.,Wojcieszak D.,Kaczmarek D.,Borkowska A.,Prociow E.L.,Ciszewski A.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference22 articles.

1. Effects of thermally induced anatase-to-rutile phase transition in MOCVD-grown TiO2 films on structural and optical properties

2. Characterization of TiO2 and TiO2–MnO oxides prepared by sol–gel method

3. Low-pressure magnetron sputtering

4. Hot target sputtering: A new way for high-rate deposition of stoichiometric ceramic films

5. Reactively sputtered TiO2−x thin films with plasma-emission-controlled departure from stoichiometry

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