Mechanical stress dependence of the Fermi level pinning on an oxidized silicon surface-Reference-Cited by-同舟云学术

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Mechanical stress dependence of the Fermi level pinning on an oxidized silicon surface

Published:2019-06 Issue: Volume:478 Page:284-289
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Li H.,Martinelli L.,Cadiz F.,Bendounan A.,Arscott S.,Sirotti F.,Rowe A.C.H.^ORCID

Funder

Agence Nationale de la Recherche

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference37 articles.

1. Fabrication and ethanol sensing characteristics of ZnO nanowire gas sensors

2. Defect detection on semiconductor wafer surfaces

3. Impact of surfaces on the optical properties of GaAs nanowires

4. Strained Interface Defects in Silicon Nanocrystals

5. Tuning the surface Fermi level on p-type gallium nitride nanowires for efficient overall water splitting

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Highly transparent conducting Two-Dimensional electron gas channel in ultrathin heterostructures for flexible optoelectronic device applications;Applied Surface Science;2022-04

2. Work function tailoring in gallium phosphide nanowires;Applied Surface Science;2021-10

3. Piezoresistance in Defect-Engineered Silicon;Physical Review Applied;2021-01-25

4. Giant, Anomalous Piezoimpedance in Silicon-on-insulator;Physical Review Applied;2019-04-03

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