Interlayer analysis of HfO2/SiO2/Si by SIMS and HRBS

Author:

Sasakawa K.,Fujikawa K.,Toyoda T.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference2 articles.

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. First-principles study of electronic, cohesive and elastic properties of silica polymorphs;Materials Today Communications;2022-06

2. Synergistic effects in MOS capacitors with an Au/HfO2–SiO2/Si structure irradiated with neutron and gamma ray;Journal of Physics D: Applied Physics;2021-12-15

3. Ultra-thin film and interface analysis of high-k dielectric materials employing Time-Of-Flight Medium Energy Ion Scattering (TOF-MEIS);Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2014-08

4. Electronic interactions of medium-energy ions in hafnium dioxide;Physical Review A;2014-03-20

5. Electronic stopping power of hydrogen in HfO2 at the stopping maximum and below;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2014-02

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