Study of plasma immersion ion implantation into silicon substrate using magnetic mirror geometry-Reference-Cited by-同舟云学术

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Study of plasma immersion ion implantation into silicon substrate using magnetic mirror geometry

Published:2012-10 Issue:24 Volume:258 Page:9564-9569
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Pillaca E.J.D.M.,Ueda M.,Kostov K.G.,Reuther H.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference28 articles.

1. Plasma source ion-implantation technique for surface modification of materials;Conrad;Journal of Applied Physics,1987

2. Handbook of Plasma Immersion Ion Implantation & Deposition;Anders,2000

3. The Bohm criterion and sheath formation;Riemann;Journal of Physics D,1991

4. The plasma sheath boundary region;Franklin;Journal of Physics D,2003

5. A fluid treatment of the plasma presheath for collisionless and collisional plasmas;Scheuer;Physics of Fluids B,1990

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4. New possibilities of plasma immersion ion implantation (PIII) and deposition (PIII&D) in industrial components using metal tube fixtures;Surface and Coatings Technology;2017-02

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