Metal vapor vacuum-arc ion implantation effects on the adhesion and hardness of ion-beam deposited Cr/Cu films-Reference-Cited by-同舟云学术

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Metal vapor vacuum-arc ion implantation effects on the adhesion and hardness of ion-beam deposited Cr/Cu films

Published:2007-01 Issue:6 Volume:253 Page:3276-3283
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Yu Miao,Zhang Jizhong,Li Dexing,Meng Qingli,Li Wenzhi

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference22 articles.

1. Silicides and ohmic contacts

2. Transition metals in silicon

3. GIXRD and XPS investigation of silicidation in ion beam mixed system

4. Diffusion barrier performance of thin Cr films in the Cu/Cr/Si structure

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Properties of Cu film and Ti/Cu film on polyimide prepared by ion beam techniques;Applied Surface Science;2010-09

2. Unobstructed electron transfer on porous polyelectrolyte nanostructures and its characterization by electrochemical surface plasmon resonance;Electrochimica Acta;2010-06

3. Synthesis of molybdenum silicide by both ion implantation and ion beam assisted deposition;Applied Surface Science;2008-02

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