The role of Ar plasma treatment in generating oxygen vacancies in indium tin oxide thin films prepared by the sol-gel process-Reference-Cited by-同舟云学术

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The role of Ar plasma treatment in generating oxygen vacancies in indium tin oxide thin films prepared by the sol-gel process

Published:2017-05 Issue: Volume:405 Page:344-349
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Hwang Deuk-Kyu,Misra Mrinmoy,Lee Ye-Eun,Baek Sung-Doo,Myoung Jae-Min,Lee Tae Il

Funder

National Research Foundation of Korea

Korea government

LG Display academic industrial cooperation program

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference27 articles.

1. Sputtered ITO for application in thin-film silicon solar cells: relationship between structural and electrical properties;Hotovy;Appl. Surf. Sci.,2013

2. Indium tin oxide (ITO) thin film gas sensor for detection of methanol at room temperature;Patel;Sens. Actuators B,2003

3. Highly transparent quantum-dot light-emitting diodes with sputtered indium-tin-oxide electrodes;Wang;J. Mater. Chem. C,2016

4. Fabrication of highly transparent and conductive indium–tin oxide thin films with a high figure of merit via solution processing;Chen;Langmuir,2013

5. Effect of process parameters on the characteristics of indium tin oxide thin film for flat panel display application;Lee;Thin Solid Films,1997

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