Examining the influence of W thickness on the Si-on-W Interface: A comparative metrology analysis
Author:
Funder
Nederlandse Organisatie voor Wetenschappelijk Onderzoek
University of Twente
Publisher
Elsevier BV
Reference31 articles.
1. Post deposition nitridation of Si in W/Si soft X-ray multilayer systems;Medvedev;Thin. Solid. Films.,2021
2. D. IJpes, Interface engineered ultrashort period soft X-ray multilayers: Growth, characterization, and optical response, (2023).
3. Growth and optical performance of short-period W/Al and polished W/Si/Al/Si multilayers;IJpes;J. Appl. Phys.,2023
4. Unveiling the effects of the surface and in-depth nanostructure on the far-UV optical reflectance of thin fluoride multilayer coatings;López-Reyes;Appl. Surf. Sci.,2023
5. Interface formation in W/Si multilayers studied by low energy ion scattering;Zameshin;Thin. Solid. Films.,2021
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