Ultrafast laser based hybrid methodology of silicon microstructure fabrication for optoelectronic applications-Reference-Cited by-同舟云学术

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Ultrafast laser based hybrid methodology of silicon microstructure fabrication for optoelectronic applications

Published:2017-10 Issue: Volume:420 Page:63-69
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Kanaujia Pawan K.,Bulbul Angika,Parmar Vinod,Prakash G. Vijaya

Funder

DST-FIST (UFO facility) scheme, High-impact Research initiative of IIT Delhi and UK-India Education Research Initiative (UKIERI)

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference55 articles.

1. Photonic crystals: writing 3D photonic structures with light;Michel Lourtioz;Nat. Mater.,2004

2. Direct laser writing of three-dimensional photonic-crystal templates for telecommunications;Deubel;Nat. Mater.,2004

3. Femtosecond laser interference technique with diffractive beam splitter for fabrication of three-dimensional photonic crystals;Kondo;Appl. Phys. Lett.,2001

4. The past present, and future of silicon photonics;Soref;IEEE J. Sel. Top. Quantum Electron.,2006

5. Nanostructured silicon as a photonic material;Pavesi;Opt. Laser Eng.,2003

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