Structural characterization of the interface structure of amorphous silicon thin films after post-deposition argon or hydrogen plasma treatment-Reference-Cited by-同舟云学术

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Structural characterization of the interface structure of amorphous silicon thin films after post-deposition argon or hydrogen plasma treatment

Published:2017-05 Issue: Volume:403 Page:200-205
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Neumüller Alex,Sergeev Oleg,Vehse Martin,Agert Carsten

Funder

ERA.NET RUS PLUS Project Flexapp

German Federal Ministry of Economics and Technology

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference43 articles.

1. Amorphous silicon oxinitride in silicon thin-film solar cells;Walder;Energy Proc.,2014

2. Comparison of silicon oxide and silicon carbide absorber materials in silicon thin-film solar cells;Walder;EPJ Photovolt.,2015

3. Nanocrystalline thin film silicon solar cells: a deeper look into p/i interface formation;Lyubchyk;Thin Solid Films,2015

4. 24.7%; Record efficiency HIT solar cell on thin silicon wafer;Taguchi;IEEE J. Photovolt.,2014

5. Toward a better physical understanding of a-Si:H/c-Si heterojunction solar cells;Damon-Lacoste;J. Appl. Phys.,2009

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1. Precise morphology control of in-plane silicon nanowires via a simple plasma pre-treatment;Applied Surface Science;2022-08

2. A critical study on different hydrogen plasma treatment methods of a-Si: H/c-Si interface for enhanced defect passivation;Applied Surface Science;2021-07

3. Pure hydrogen references synthesized by low energy ion implantation into amorphous silicon;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2019-03

4. Effect of deposition rate on the growth mechanism of microcrystalline silicon thin films using very high frequency PECVD;Optik;2019-02

5. Improved amorphous silicon passivation layer for heterojunction solar cells with post-deposition plasma treatment;Nano Energy;2018-01

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