Black silicon with nanostructured surface formed by low energy helium plasma irradiation-Reference-Cited by-同舟云学术

Black silicon with nanostructured surface formed by low energy helium plasma irradiation

Published:2019-09 Issue: Volume:487 Page:755-765
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Takamura S.,Aota T.,Iwata H.,Maenaka S.,Fujita K.,Kikuchi Y.,Uesugi Y.

Funder

JSPS

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference38 articles.

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2. Surface nanostructure formation and optical properties of black silicon obtained with He plasma exposure;Takamura;Bulltin of Aichi Institute of Technology,2018

3. Control of shape of silicon needles fabricated by highly selective anisotropic dry etching;Kanechika;J. Vac. Sci. Technol. B,2002

4. An 18.2%-efficient black-silicon solar cell achieved through control of carrier recombination in nanostructures;Oh;Nature Nanotech,2012

5. Black silicon with controllable macropore array for enhanced photoelectrochemical performance;Ao;Appl. Phys. Letters,2012

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