Metastability of a-SiOx:H thin films for c-Si surface passivation-Reference-Cited by-同舟云学术

Metastability of a-SiOx:H thin films for c-Si surface passivation

Published:2017-01 Issue: Volume:392 Page:430-440
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Serenelli L.,Martini L.,Imbimbo L.,Asquini R.,Menchini F.,Izzi M.,Tucci M.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference53 articles.

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