Removal of the photoresist (PR) and metallic-polymer in the concave-typed storage node using the excimer laser-Reference-Cited by-同舟云学术

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Removal of the photoresist (PR) and metallic-polymer in the concave-typed storage node using the excimer laser

Published:2004-04 Issue:1-4 Volume:228 Page:100-109
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Kim Hyun-Jung,Kim Dae-Jin,Ryu Je-Kil,Pak Sung-Sik

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference20 articles.

1. W.M. Lee, Technical Report. EKC Technology Inc., 2000.

2. S.J. Kirk, T.T. Nguyen, in: Technical Proceedings, Singapore, 1995.

3. Ablation and cleaning of wafer surface by excimer laser

4. Y.P. Lee, Y.F. Lu, S.H.C. Daniel, J. Appl. Phys. 28 (1997) 2524.

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