Thermal annealing in FHD Ge-doped SiO2 film for applications in optical waveguides-Reference-Cited by-同舟云学术

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Thermal annealing in FHD Ge-doped SiO2 film for applications in optical waveguides

Published:2004-04 Issue:1-4 Volume:228 Page:48-52
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Zhang Letian,Xie Wenfa,Wang Jian,Li Aiwu,Xing Hua,Zheng Wei,Zhang Yushu

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference18 articles.

1. Quantum confinement effects of semiconducting microcrystallites in glass

2. Silica waveguides on silicon and their application to integrated-optic components

3. State of the Art of Integrated Optics Technology at LETI for Achieving Passive Optical Components

4. Photosensitization of optical fiber and silica-on-silicon/silica waveguides

5. Electron-beam-induced densification of Ge-doped flame hydrolysis silica for waveguide fabrication

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Microstructure of Ge:Ta₂O₅ Granular Thin Films: an Application of TEM-Tomography;MATERIALS TRANSACTIONS;2007

2. Photosensitivity in GeO2–SiO2 glasses and optical waveguides;Materials Letters;2006-12

3. Fabrication and ultraviolet photosensitivity of Ge-doped silica films using FHD for optical waveguide;Physica B: Condensed Matter;2006-03

4. UV-Irradiation-Induced Refractive Index Increase of Ge-Doped Silica Films;Materials Science Forum;2005-01

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