Microstructured silicon surfaces for field emission devices

Author:

Sotgiu G.,Schirone L.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Effect of surfactant and etching time on p-type porous silicon formation through potentiostatic anodization;ADV NAT SCI-NANOSCI;2022

2. Effect of surfactant and etching time on p-type porous silicon formation through potentiostatic anodization;Advances in Natural Sciences: Nanoscience and Nanotechnology;2022-09-01

3. Field-Emission from Finely Nicked Structures on n-Type Silicon Substrate Formed by Sandblasting Process;IEICE Transactions on Electronics;2019-02-01

4. Analysis of ultraviolet exposure effects on the surface properties of epoxy/graphene nanocomposite films on Mylar substrate;Acta Astronautica;2017-05

5. Porous Silicon and Cold Cathodes;Porous Silicon: From Formation to Applications: Optoelectronics, Microelectronics, and Energy Technology Applications, Volume Three;2016-01-07

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