Nonideality of Au/Si and Au/GaAs Schottky barriers due to process-induced defects-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Nonideality of Au/Si and Au/GaAs Schottky barriers due to process-induced defects

Published:2006-06 Issue:16 Volume:252 Page:5659-5675
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Maeda Keiji

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference71 articles.

1. Metal–Semiconductor Contacts;Rhoderick,1988

2. Semiconductor Surfaces and Interfaces;Monch,1995

3. Thin Films-Interdiffusion and Reactions;Sinha,1978

4. The structure and properties of metal-semiconductor interfaces

5. Metal-semiconductor interfaces

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nano inhomogeneity effects on small Ag/n-Si Schottky diode parameters at high temperature;Journal of Semiconductors;2013-08

2. Current transport mechanisms and deep level transient spectroscopy of Au/n-Si Schottky barrier diodes;Microelectronic Engineering;2011-11

3. Effect of diode size and series resistance on barrier height and ideality factor in nearly ideal Au/n type-GaAs micro Schottky contact diodes;Chinese Physics B;2010-10

4. Method to determine the interface’s fractal dimensions of metal-semiconductor electric contacts from their static instrumental characteristics;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2010-02

5. Sputter-induced trap states at oxidized and grafted silicon surfaces: A comparative study;Thin Solid Films;2009-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3