Dopant based electron beam lithography in CuxTiSe2-Reference-Cited by-同舟云学术

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Dopant based electron beam lithography in CuxTiSe2

Published:2011-02 Issue:8 Volume:257 Page:3812-3816
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Kidd T.E.,Klein D.,Rash T.A.,Strauss L.H.

Funder

Battelle foundation

Iowa Office of Energy Independence

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference24 articles.

1. Elektronenoptischer Mikroschreiber unter elektronenmikroskopischer Arbeitskontrolle: (Informations-Speicherung auf kleinstem Raum)

2. Unconventional Methods for Fabricating and Patterning Nanostructures

3. Electron beam lithography—Resolution limits

4. Gold Nanoparticle Patterning of Silicon Wafers Using Chemical e-Beam Lithography

5. Radiation damage in the TEM and SEM

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Magnetic properties of Co doped WSe2 by implantation;Journal of Alloys and Compounds;2018-01

2. Controlled electronic and magnetic properties of WSe2 monolayers by doping transition-metal atoms;Superlattices and Microstructures;2016-12

3. Universal Method for Creating Optically Active Nanostructures on Layered Materials;Langmuir;2014-05-13

4. Semiconductor-metal transition in semiconducting bilayer sheets of transition-metal dichalcogenides;Physical Review B;2012-08-24

5. High-pressure study of transport properties in Co0.33NbS2;Physical Review B;2011-08-15

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