Degradation study of arsenic oxides under XPS measurements-Reference-Cited by-同舟云学术

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Degradation study of arsenic oxides under XPS measurements

Published:2020-05 Issue: Volume:511 Page:145606
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Viltres Herlys,Odio Oscar F.,Lartundo-Rojas Luis,Reguera Edilso

Funder

CONACyT

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference58 articles.

1. Growth and trends in Auger-electron spectroscopy and x-ray photoelectron spectroscopy for surface analysis;Powell;J. Vac. Sci. Technol., A,2003

2. Practice of surface and interface analysis with AES and XPS;Hofmann,2013

3. Photon beam damage and charging at solid surfaces;Thomas,2002

4. Introduction to surface science spectra data on electron and x-ray damage: sample degradation during XPS and AES measurements;Baer;Surf. Sci. Spectra.,2003

5. Surface reduction of solid 3d transition metal compounds during X-ray photoelectron spectroscopy;Wallbank;J. Electron. Spectrosc. Relat. Phenom.,1974

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