Experimental investigation of photoresist etching by kHz AC atmospheric pressure plasma jet-Reference-Cited by-同舟云学术

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Experimental investigation of photoresist etching by kHz AC atmospheric pressure plasma jet

Published:2016-11 Issue: Volume:385 Page:191-198
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Wang Lijun,Zheng Yashuang,Wu Chen,Jia Shenli

Funder

Fundamental Research Funds for the Central Universities of China

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference20 articles.

1. Deactivation of lipopolysaccharide by Ar and H2 inductively coupled low-pressure plasma;Bartis;J. Phys. D: Appl. Phys.,2014

2. Inactivation of a 25.5μm Enterococcus faecalis biofilm by a room-temperature, battery-operated, handheld air plasma jet;Pei;J. Phys. D: Appl. Phys.,2012

3. Arc-free atmospheric pressure cold plasma jets: a review;Laroussi;Plasma Process. Polym.,2007

4. The atmospheric-pressure plasma jet: a review and comparison to other plasma sources;Schutze;IEEE Trans. Plasma Sci.,1998

5. Superficial treatment of mammalian cells using plasma needle;Stoffels;J. Phys. D: Appl. Phys.,2003

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